发明名称 Nitride Light Emitting Diode and Fabrication Method Thereof
摘要 A nitride light-emitting diode including: a substrate with sub-micro patterns over the surface, which is divided into a growth region and a non-growth region; a growth blocking layer, formed in the non-growth region of the substrate for blocking epitaxial growth in the non-growth region of the substrate; a light-emitting epitaxial layer, comprising an n-type layer, a light-emitting layer and a p-type layer, formed in the growth region of the substrate, which extends to the non-growth region through lateral epitaxy and covers the growth blocking layer; wherein, the refractive index of the growth blocking layer is less than that of the light-emitting epitaxial layer and the growth blocking layer forms undulating morphology along the sub-micro patterns of the substrate, thus increasing light extraction interface of LED, generating refractive index difference between the light-emitting epitaxial layer and the light extraction interface and improving light extraction efficiency.
申请公布号 US2015311389(A1) 申请公布日期 2015.10.29
申请号 US201514742150 申请日期 2015.06.17
申请人 XIAMEN SANAN OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 LIN WEN-YU;YEH MENG-HSIN;ZHONG ZHIBAI
分类号 H01L33/22;H01L33/32;H01L33/06;H01L33/44;H01L27/15;H01L25/075;H01L33/24;H01L33/00 主分类号 H01L33/22
代理机构 代理人
主权项 1. A nitride light-emitting diode, comprising: a substrate having a surface with sub-micro patterns, including a growth region and a non-growth region; a growth blocking layer, formed in the non-growth region of the substrate for blocking epitaxial growth in the non-growth region of the substrate; a light-emitting epitaxial layer, comprising an n-type layer, a light-emitting layer, and a p-type layer, formed in the growth region of the substrate, extending to the non-growth region through lateral epitaxy and covering the growth blocking layer; wherein, a refractive index of the growth blocking layer is less than that of the light-emitting epitaxial layer, and the growth blocking layer forms undulating morphology along the sub-micro patterns of the substrate, thereby increasing a light extraction interface of light-emitting diode and generating a refractive index difference between the light-emitting epitaxial layer and the light extraction interface.
地址 Xiamen CN
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