METHOD OF FORMING A THIN FILM AND METHOD OF MANUFACTURING A NONVOLATILE MEMORY DEVICE USING THE SAME

摘要

The present invention provides a method for forming a thin film and a method for manufacturing a nonvolatile memory device using the same which comprise the following steps of: depositing a thin film layer on a substrate; and including impurities in the thin film layer by performing treatment on the thin film layer. Deposition and treatment of the thin film layer are repetitively performed several times.