RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide: a radiation-sensitive resin composition that gives a favorable pattern profile, excels in MEEF (mask error enhancement factor) performance, and less likely causes defects such as a bridge; a polymer suitably used for the radiation-sensitive resin composition; and a method for forming a pattern using the radiation-sensitive resin composition.SOLUTION: The radiation-sensitive resin composition comprises: [A] a polymer having a (meth)acrylate unit (I) that has an acid-dissociable group with a five-membered or six-membered ring alicyclic structure, and a (meth)acrylate unit structure (II) that has a terminal ester structure and a connecting group including a fluorine atom or a fluorinated hydrocarbon group, in which the content of fluorine atoms is 5 mass% or more; [B] a polymer having an acid-dissociable group and having a content of fluorine atoms of less than 5 mass%; and [C] a radiation-sensitive acid generator. The content of the [A] polymer is preferably 0.1 parts by mass or more and 20 parts by mass or less with respect to 100 parts by mass of the [B] polymer.