发明名称 窒化物半導体発光ダイオード素子
摘要 A nitride semiconductor structure includes: a substrate having a growth surface, a convex portion and a concave portion being formed on the growth surface; and a nitride semiconductor film grown on the growth surface. A cavity is formed between the nitride semiconductor film and the substrate in the concave portion.
申请公布号 JP5815144(B2) 申请公布日期 2015.11.17
申请号 JP20150017043 申请日期 2015.01.30
申请人 シャープ株式会社 发明人 津田 有三;湯浅 貴之
分类号 H01L33/22;H01L21/20;H01L21/205;H01L33/00;H01L33/20;H01L33/32;H01S5/323 主分类号 H01L33/22
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