发明名称 CLEANING DEVICE AND SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To facilitate positioning of a nozzle.SOLUTION: A cooling device 35 includes: a block manifold 352; a nozzle 360; and a fixing structure 370. The block manifold 352 is disposed facing a polishing pad. A passage 354, in which a fluid for cooling the polishing pad flows, is formed in the block manifold 352. The nozzle 360 blows the fluid in the passage 354 to the polishing pad. The fixing structure 370 includes: a fixing plate 372 in which a fitting hole 374 for fitting the nozzle 360 therein and fixing the nozzle 360 is formed; and a bolt 378 for fixing the fixing plate 372 to the block manifold 352 with the nozzle 360 fitting in the fitting hole 374.
申请公布号 JP2015205355(A) 申请公布日期 2015.11.19
申请号 JP20140085592 申请日期 2014.04.17
申请人 EBARA CORP 发明人 NAGAOKA KENICHI;USHIMARU SEIYA;KODERA TAKESHI;UMEMOTO MASAO;ISHIKAWA YOSHINORI
分类号 B24B37/015;B24B55/02;H01L21/304 主分类号 B24B37/015
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