| 摘要 |
PROBLEM TO BE SOLVED: To provide multibeam lithography apparatus which allows for an efficient technique for drawing a structure, in one-dimensional circuit design.SOLUTION: A beam shaping device of each column includes an aperture array device 203 including at least one of aperture arrays 231, 232, and each of the aperture arrays 231, 232 includes a large number of apertures defining the shape of respective sub-beams. The aperture forms a rectangular shape of the sub-beam, when viewing in the beam direction. The rectangular shape has a short side aX and a long side aY, where the long side aY is at least 2 times of the short side aX. |
