PROCESS OF PLASMA-CHEMICAL CLEANING PRIOR TO PVD OR PECVD COATING

摘要

The invention relates to a process for the cleaning and then coating of metal surfaces. The metal surfaces (substrates) are cleaned by a microwave-excited plasma using alternatley oxygen and hydrogen as the working gas, with at least a single alternation. Thereafter coating is performed by a physical vapour deposition processs (PVD) or a plasma enhanced chemical vapour deposition process (PECVD). The process has a universal cleaning effect, is compatible with the coating techniques and is economical to use.