Method and Apparatus for Reducing Stripe Patterns

摘要

An apparatus comprises an optical detector configured to receive scattered light signals from a surface of a wafer including a plurality of sensor arrays, each of which has a boundary smaller than a boundary of a laser beam, a light source optically coupled to the surface of the wafer, wherein light from the light source hits the surface with a small incident angle and a processor configured to measure a distance between a sensor array boundary and a laser beam boundary, wherein a laser annealing process is recalibrated if the distance is less than a predetermined value.

主权项

1. A device comprising:
a wafer comprising a plurality of square units arranged in cows and columns, wherein a boundary of each square unit is smaller than a boundary of a laser beam applied to the wafer; a light source optically coupled to a top surface of the wafer through a mirror; an optical detector configured to receive scattered light signals from the top surface of the wafer; and a processor configured to measure a distance between a boundary of a square unit and the boundary of the laser beam.