发明名称 パターン形成方法及びパターン形成装置
摘要 According to one embodiment, a pattern formation method is disclosed. The method is configured to transfer a shape of a pattern to a plurality of shot regions of an object using a mold including a first pattern region and a second pattern region aligned with the first pattern region. The method can include transferring the shape of the pattern to each of the plurality of shot regions sequentially in a first direction from the first pattern region toward the second pattern region when the shape of the pattern is transferred using the first pattern region. The method can include transferring the shape of the pattern to each of the plurality of shot regions sequentially in a second direction from the second pattern region toward the first pattern region when the shape of the pattern is transferred using the second pattern region.
申请公布号 JP5833045(B2) 申请公布日期 2015.12.16
申请号 JP20130041993 申请日期 2013.03.04
申请人 株式会社東芝 发明人 辻 真俊;中杉 哲郎;幡野 正之
分类号 H01L21/027;B29C59/02 主分类号 H01L21/027
代理机构 代理人
主权项
地址