| 摘要 |
<p>PURPOSE:To provide the X-ray mask capable of attaining to the reinforcement frame junction at high visible ray transmittivity and yet low deformation level. CONSTITUTION:A protective film 2 is to be formed on the rear surface of a mask supporter (base substrate) 1 before the formation of a mask substrate i.e., an X-ray transmissive thin film 3a on the mask supporter 1. Besides, a buffer layer is to be formed at the substrate temperature of 700-900 deg.C before the formation of the X-ray transmissive thin film 3a. Furthermore, the buffer layer to be formed before the formation of the X-ray transmissive thin film 3a is to be etched away after the formation of the X-ray transmissive thin film 3a.</p> |
