Fin structure and method for forming the same

摘要

According to an exemplary embodiment, a method of forming a fin structure is provided. The method includes the following operations: etching a first dielectric layer to form at least one recess and a first core portion of a fin core; form an oxide layer as a shallow trench isolation layer in the recess; etching back the oxide layer to expose a portion of the fin core; and forming a fin shell to cover a sidewall of the exposed portion of the fin core.

主权项

1. A fin structure, comprising:
a fin core protruding from a substrate, comprising:
a first core portion; anda second core portion over the first core portion; and a fin shell covering a portion of a sidewall of the fin core, wherein a material of the second core portion has a lattice constant between a material of the first core portion and a material of the fin shell.