| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material capable of forming a resist line having a uniform line width. SOLUTION: The resist material applied on a substrate 10 so as to carry out microfabrication with light, electron beams or X-rays contains a liquid- crystalline polymer 11 which aligns in a direction perpendicular to the surface of the substrate 10 as the longitudinal direction in a resist film 12 in film formation on the substrate 10. |
