INFRARED LIGHT SENSITIVE ETCHING OR PLATING RESIST

摘要

PROBLEM TO BE SOLVED: To provide an infrared light sensitive etching or plating resist having high sensitivity, excellent in stability and not requiring an oxygen intercepting film. SOLUTION: The infrared light sensitive etching or plating resist contains a (meth)acrylate monomer having ethylene oxide and/or propylene oxide as a structural unit, an infrared absorbing dye and a polymerization initiator.