发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To increase an occupied area of a capacitor in a semiconductor device such as a DRAM.SOLUTION: A semiconductor device 100 comprises a memory cell region (active region 1A) which is composed of a plurality of transistor pillars 5 vertically arranged on a surface of a semiconductor substrate and a plurality of capacitors 56 connected to respective top faces of the plurality of transistor pillars, and which is arranged to make planar centers of the plurality of transistor pillars 5 form a planar closest packing arrangement.
申请公布号 JP2015226001(A) 申请公布日期 2015.12.14
申请号 JP20140111156 申请日期 2014.05.29
申请人 MICRON TECHNOLOGY INC 发明人 KAWAKAMI YUKIYA
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
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