发明名称 SEMICONDUCTOR DEVICE AND EVALUATION METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To easily improve a decrease in yield due to a gate leakage fault caused by a pin hole and the like of a gate oxide film in a power transistor without side effects such as an area increase.SOLUTION: In a semiconductor device having a transistor composed of a plurality of unit transistors connected in parallel with each other: gate electrodes of respective unit transistors are connected to first wiring in common to be linked to a first gate input terminal; and source electrodes of respective unit transistors are connected to second wiring in common to be linked to a source input terminal; and drain electrodes of respective unit transistors are connected to third wiring in common to be linked to a drain input terminal; and a first fuse element is arranged between the gate electrode of each unit transistor and the first wiring.
申请公布号 JP2015225990(A) 申请公布日期 2015.12.14
申请号 JP20140110897 申请日期 2014.05.29
申请人 PANASONIC IP MANAGEMENT CORP 发明人 MORIWAKI NOBUYUKI
分类号 H01L21/82;H01L21/822;H01L27/04 主分类号 H01L21/82
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