发明名称 ABRASIVE PAD AND DETERMINATION METHOD OF ABRASIVE PAD
摘要 PROBLEM TO BE SOLVED: To provide an abrasive pad having high polishing rate, and to provide a determination method of the abrasive pad.SOLUTION: A plastic deformation region A calculated by the following mathematical formula A=(S1-S2)×(E1-E2)/2 is 665 or less, where the maximum stress S1(MPa) is the tensile stress of a polishing layer immediately before fracture when a tensile force acts, a strength point stress S2(MPa) is a tensile stress occurring in the polishing layer which has started plastic deformation, the maximum elongation E1(mm) is the elongation of the polishing layer after the tensile force begins to act until immediately before fracture, and the strength point elongation E2(mm) is the elongation of the polishing layer after the tensile force begins to act until plastic deformation starts.
申请公布号 JP2015226016(A) 申请公布日期 2015.12.14
申请号 JP20140111430 申请日期 2014.05.29
申请人 NITTA HAAS INC 发明人 USUYA MIYUKI;OGATA KENJIRO
分类号 H01L21/304;B24B37/24 主分类号 H01L21/304
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