PLASMA PROCESSING METHOD AND APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing method and apparatus capable of preventing a holding sheet of transfer carrier from getting thermal-damaged due to plasma processing.SOLUTION: The plasma processing method includes: a first step in which a transfer carrier 4 holding a substrate 2 is placed on a cooled stage 11 disposed in a processing chamber 5; a second step in which a cover 24 disposed on the stage 11 and the stage 11 are caused to make a relative movement to cover a holding sheet 6 of the transfer carrier 4 and the frame 7 in a state the substrate 2 is exposed from a window 25 formed in the cover 24; a third step in which a plasma processing is made on the substrate 2 held by the transfer carrier 4; a fourth step to cool the cover 24; and a fifth step in which the transfer carrier 4 holding the substrate 2 is carried out from the processing chamber 5.