| 摘要 |
PROBLEM TO BE SOLVED: To suppress retention of a polishing material in a recess or the like on an occlusal surface of an artificial tooth and enable the whole surface of the artificial tooth including the occlusal surface to be polished evenly and sufficiently by, when polishing the artificial tooth, promoting the mixing of the polishing material so that the polishing material can flow on the whole surface of the artificial tooth evenly and sufficiently.SOLUTION: A polishing device 1 for an artificial tooth includes a first rotation shaft 7 that rotates by the drive force of a motor 6a, a second rotation shaft 9 that rotates while revolving around the first rotation shaft 7 accompanying the rotation of the first rotation shaft 7, a rotation transmission mechanism 8 for transmitting the rotation of the first rotation shaft 7 to the second rotation shaft 9, and an artificial tooth holder 15 provided to the second rotational shaft 9 that integrally rotates with the second rotation shaft 9, and polishes the artificial tooth 28 held by the artificial tooth holder 15 while rotating the artificial holder 15 in a polishing tank 4. The artificial tooth holder 15 holds the artificial tooth 28 obliquely downward with respect to a horizontal plane 29. |
