发明名称 |
PRODUCTION METHOD OF SILICON CARBIDE INGOT |
摘要 |
PROBLEM TO BE SOLVED: To raise a crystal growth rate while suppressing contamination of a heterogeneous polytype in producing a silicon carbide ingot.SOLUTION: A production method of a silicon carbide ingot includes a step for preparing a raw material and a seed crystal, and a crystal growth step for sublimating the raw material and reprecipitating the sublimated raw material on the seed crystal to grow a single crystal. The temperature difference between the raw material and the growing seed crystal is 200°C or less. The crystal growth step includes a first step for growing the single crystal for 10 minutes or more and 10 hours or less under a pressure condition of 1.33 kPa or higher and 2.67 kPa or lower while keeping the temperature of the single crystal in a first temperature zone, and a second step for raising the temperature of the single crystal to a second temperature zone which is higher than the first temperature zone and further growing the single crystal while keeping the temperature of the single crystal in the second temperature zone. |
申请公布号 |
JP2015224169(A) |
申请公布日期 |
2015.12.14 |
申请号 |
JP20140111170 |
申请日期 |
2014.05.29 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
UETA SHUNSAKU;HORI TSUTOMU;MATSUSHIMA AKIRA |
分类号 |
C30B29/36;C30B23/06 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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