发明名称 PRODUCTION METHOD OF SILICON CARBIDE INGOT
摘要 PROBLEM TO BE SOLVED: To raise a crystal growth rate while suppressing contamination of a heterogeneous polytype in producing a silicon carbide ingot.SOLUTION: A production method of a silicon carbide ingot includes a step for preparing a raw material and a seed crystal, and a crystal growth step for sublimating the raw material and reprecipitating the sublimated raw material on the seed crystal to grow a single crystal. The temperature difference between the raw material and the growing seed crystal is 200°C or less. The crystal growth step includes a first step for growing the single crystal for 10 minutes or more and 10 hours or less under a pressure condition of 1.33 kPa or higher and 2.67 kPa or lower while keeping the temperature of the single crystal in a first temperature zone, and a second step for raising the temperature of the single crystal to a second temperature zone which is higher than the first temperature zone and further growing the single crystal while keeping the temperature of the single crystal in the second temperature zone.
申请公布号 JP2015224169(A) 申请公布日期 2015.12.14
申请号 JP20140111170 申请日期 2014.05.29
申请人 SUMITOMO ELECTRIC IND LTD 发明人 UETA SHUNSAKU;HORI TSUTOMU;MATSUSHIMA AKIRA
分类号 C30B29/36;C30B23/06 主分类号 C30B29/36
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