| 摘要 |
PROBLEM TO BE SOLVED: To solve a technological problem of an improvement in coating performance of a variously used slit coater, for example, uniformization of film pressure, and application to a wide range coating liquid, when forming a functional film on a wafer and a glass substrate in a manufacturing process of an electronic device.SOLUTION: A high-quality and highly reliable coating applicator and a coating method are provided by controlling this based on constant algorithm, by detecting application of a coating head capable of coping with the realization of high accuracy and a flow rate variation in a coating process in real time. A change in a state quantity in the coating process, actually, a film thickness measurement trend just after coating and a pressure variation in a liquid storage part inside of the coating head are highly accurately detected, and the relationship between these state quantity and flow rate is clarified from a database provided by a preexamination, and high accuracy coating can be realized by feeding back to a command value of a liquid feed pump being a controller. |
