发明名称 SUBSTRATE FOR INPUT DEVICE APPARATUS, APPARATUS AND PRODUCTION METHOD OF THE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate for input device apparatuses which is for input device apparatuses, low in average coefficient of linear thermal expansion and high in bendability.SOLUTION: In a substrate for input device apparatuses, glass cloth 2 is plain-woven and uses E glass, and a silane coupling agent is provided on the glass cloth 2. The substrate uses an aromatic glycidyl type epoxy compound consisting of a bisphenol type epoxy compound and has an average coefficient of linear thermal expansion of 0-40 ppm, a glass transition temperature of 130°C or higher and an elastic modulus at 250°C of 1 GPa or greater.
申请公布号 JP2015224342(A) 申请公布日期 2015.12.14
申请号 JP20140112346 申请日期 2014.05.30
申请人 SUMITOMO BAKELITE CO LTD 发明人 EGUCHI TOSHIMASA;ISOBE DAISUKE;OTSUKA HIROYUKI;NAITO MANABU
分类号 C08J5/08;B32B15/08;H05K1/03 主分类号 C08J5/08
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