发明名称 GRINDING POLISHING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a grinding polishing device that polishes a circular plate-like work to a uniform thickness.SOLUTION: The grinding polishing device 1 includes: polishing means 3 for polishing the circular plate-like work; a dress mechanism 4 for dressing a polishing surface 36 of the polishing means; polish feeding means 37 for moving the polishing means close to or apart from a dressing surface 41 of the dress mechanism; and radial thickness measurement means for measuring thickness distribution in a radial direction of the circular plate-like work. The grinding polishing device adjusts a feed amount of the polish feeding means according to the thickness distribution measured by the radial thickness measurement means to form a surface that is polished according to the thickness of the circular plate-like work.
申请公布号 JP2015223636(A) 申请公布日期 2015.12.14
申请号 JP20140108171 申请日期 2014.05.26
申请人 DISCO ABRASIVE SYST LTD 发明人 ASAI KOHEI;SUZUKI TAKAMASA
分类号 B24B37/00;B24B7/00;B24B53/00;H01L21/304 主分类号 B24B37/00
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