发明名称 |
GRINDING POLISHING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a grinding polishing device that polishes a circular plate-like work to a uniform thickness.SOLUTION: The grinding polishing device 1 includes: polishing means 3 for polishing the circular plate-like work; a dress mechanism 4 for dressing a polishing surface 36 of the polishing means; polish feeding means 37 for moving the polishing means close to or apart from a dressing surface 41 of the dress mechanism; and radial thickness measurement means for measuring thickness distribution in a radial direction of the circular plate-like work. The grinding polishing device adjusts a feed amount of the polish feeding means according to the thickness distribution measured by the radial thickness measurement means to form a surface that is polished according to the thickness of the circular plate-like work. |
申请公布号 |
JP2015223636(A) |
申请公布日期 |
2015.12.14 |
申请号 |
JP20140108171 |
申请日期 |
2014.05.26 |
申请人 |
DISCO ABRASIVE SYST LTD |
发明人 |
ASAI KOHEI;SUZUKI TAKAMASA |
分类号 |
B24B37/00;B24B7/00;B24B53/00;H01L21/304 |
主分类号 |
B24B37/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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