| 摘要 |
PROBLEM TO BE SOLVED: To provide an extreme ultraviolet light source device with which efficient EUV radiation can be stably obtained.SOLUTION: An EUV light source device 100 includes: a first laser source 31a which irradiates a high-temperature plasma raw material 22A with a laser beam L1; and a second laser source 31b which, after the high-temperature plasma raw material 22a has been irradiated with the laser beam L1 and before effective extreme ultraviolet light is emitted, irradiates the raw material in a region with a laser beam L2, the region having being irradiated with the laser beam L1. The EUV light source device 100 further includes a return light prevention portion 321 which prevents return light of the laser beam L1 irradiated by the first laser source 31a from reaching a light emitting port of the second laser source 31b. |
