| 摘要 |
The multi-charged particle beam writing method of an embodiment of the present invention comprises the processes of: gathering the position of writing of each beam of the multi-charged particle beam to start a tracking control by a beam deflection to track the movement of a stage, to perform the tracking control, and to irradiate a beam corresponding to the ON beam from among the multi-charged particle beam at the position of writing of each beam; continuing to perform the tracking control to make a deflection of the multi-charged particle beam separately from the beam deflection for the tracking control and to shift the position of writing of each beam to the next position of writing of each beam; continuing to perform the tracking control to irradiate a beam corresponding to the ON beam from among the multi-charged particle beam at the position of writing of each beam shifted; and continuing to perform the tracking control to irradiate a beam corresponding to the position of writing of each beam after being shifted at least once, to reset the beam deflection for the tracking control, and to return the position of tracking to the reverse direction of the direction of movement of the stage. The processes from starting the tracking control to resetting are made into one group, and the group is repeated for a preset frequency to complete the writing of a certain area. The tracking time from the starting of the tracking to the resetting in a group of at least the first time from among the groups of the frequency becomes longer than the tracking time of another group. |
