IMPROVED HEAT TREATMENT CHAMBER OF SUBSTRATES AND HEAT TREATMENT APPARATUS HAVING THE SAME

摘要

The present invention discloses an improved heat treatment chamber for a substrate and a substrate heat treatment apparatus having the same. According to the present invention, the heat treatment chamber for a substrate includes: a chamber body providing a heat-treatment space for a plurality of substrates inside; a boat which is provided in the heat treatment space, and which the substrates are loaded onto and supported from; an upper heater housing provided in an upper part of the chamber body and having a plurality of upper lamp heaters therein; and a lower heater housing provided in a lower part of the chamber body and having a plurality of lower lamp heaters therein. At least one from the upper heater housing and the lower heater housing is detachably coupled to the chamber body for the heat treatment space to be expanded.