SUBSTRATE SUPPORT STAGE AND SUBSTRATE TREATMENT APPARATUS INCLUDING THE SAME AND PROCESSING METHOD USING THE SAME

摘要

The present invention relates to a substrate supporting stage, to a substrate treatment device including the same and to a substrate treatment method using the same. Included are a chamber for forming an inner space for treating a substrate; a base arranged in the chamber and including one surface, the other surface facing the one surface and a side surface for connecting the one surface and the other surface; a levitation module at least partly buried in the base and including one or more levitation regions formed on one surface facing a substrate to be able to levitate the substrate; and a vibration module at least partly arranged either inside or outside the base and arranged in contact or non-contact with the substrate to be able to vibrate the substrate. The generation of mura such as surface stripes caused by light radiated to the substrate can be inhibited by conducting the steps of: preparing a substrate to be irradiated with light on the substrate supporting stage; levitating the substrate; applying vibration to the substrate; and conducting irradiation while moving the substrate supporting stage in one direction. That is, the generation of mura caused by the change of a laser beam for each shot can be inhibited in the process of radiating a laser beam for each predetermined region for treatment. Also mura, which is generated as the radiation of a laser beam is not uniform due to steps in a distance between the substrate and the laser beam caused by the nonuniformity of flatness caused by the mounting defect of the substrate when the substrate is mounted on the stage, can be reduced.