| 摘要 |
The present invention relates to a substrate processing apparatus. According to one embodiment of the present invention, the substrate processing apparatus includes a fluid supply unit. The fluid supply unit includes a main body and a spraying body extended downwards from the main body and having an outlet port formed therein. A blade is provided on the spraying body, which prevents air around the outlet port from flowing towards the outlet port when the fluid is sprayed. |
