发明名称 |
MICELLAR TECHNOLOGY FOR POST-ETCH RESIDUES |
摘要 |
A method is provided herein for cleaning a semiconductor device. In accordance with the method, a semiconductor device is provided (101), and a micellar solution is applied (103) to the semiconductor device. The method is particularly useful for cleaning copper and silicon surfaces and removing processing residues from the surfaces of vias or trenches.
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申请公布号 |
KR20060034699(A) |
申请公布日期 |
2006.04.24 |
申请号 |
KR20067000717 |
申请日期 |
2006.01.11 |
申请人 |
FREESCALE SEMICONDUCTOR, INC. |
发明人 |
SHARMA BALGOVIND K. |
分类号 |
H01L21/304;H01L21/02;H01L21/306;H01L21/311;H01L21/768 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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