发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
According to an embodiment, a semiconductor device includes two electrodes extending in a first direction, a semiconductor layer provided between the two electrodes, an insulating film disposed between the two electrodes. The two electrodes are arranged in a second direction intersecting the first direction. The semiconductor layer extends in a third direction orthogonal to the first direction and the second direction. The insulating film covers a side surface of the semiconductor layer opposite to one of the two electrodes. The semiconductor layer has a shape in a cross section perpendicular to the third direction such that a width in the first direction at a center of the cross section is narrower than a width, in the first direction, of the side surface. |
申请公布号 |
US2015357379(A1) |
申请公布日期 |
2015.12.10 |
申请号 |
US201414483632 |
申请日期 |
2014.09.11 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
TAJIMA Hikari;Kondo Masaki;Nakai Tsukasa;Izumida Takashi;Yasutake Nobuaki |
分类号 |
H01L27/24;H01L29/78 |
主分类号 |
H01L27/24 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device, comprising:
two electrodes extending in a first direction, the two electrodes being arranged in a second direction intersecting the first direction; at least one semiconductor layer provided between the two electrodes, the semiconductor layer extending in a third direction orthogonal to the first direction and the second direction; and an insulating film provided between the two electrodes, and covering side surfaces of the semiconductor layer, the semiconductor layer having a shape in a cross section perpendicular to the third direction such that a width in the first direction at a center between the two electrodes is narrower than a width, in the first direction, of portions adjacent to the two electrodes. |
地址 |
Minato-ku JP |