| 摘要 |
The present invention relates to a substrate heat treatment apparatus which improves electrical properties of a substrate through a heat treatment. The substrate heat treatment apparatus includes: a heat-treatment chamber having a heat-treatment space for a substrate; a substrate support supporting the substrate in the heat-treatment space; a heater block installed with a plurality of heating lamps on a lamp installation surface facing the substrate; and a window blocking an optical wavelength in a preset block wavelength range of a lamp wavelength range generated in the heating lamp, and transmitting an optical wavelength in a transmission wavelength range, which is the remaining wavelength range, to deliver the optical wavelength in the transmission wavelength range to the substrate. |
