发明名称 |
VERTICAL NITRIDE SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME |
摘要 |
Disclosed is a vertical nitride semiconductor device including a conductive substrate; a semiconductor layer bonded to the conductive substrate via a second electrode; a metal layer formed on the conductive substrate; a first electrode formed on the semiconductor layer; and a bonding layer formed between the conductive substrate and the second electrode. The conductive substrate has a flange part, which extends from a side surface of the conductive substrate, on a side of the other front surface thereof. The flange part is formed in a manner in which the conductive substrate and the semiconductor layer are bonded together and then a remaining part of the conductive substrate is divided, the remaining part being formed by cutting off the semiconductor layer and part of the conductive substrate in a thickness direction so as to expose a side surface of the semiconductor layer and the side surface of the conductive substrate. |
申请公布号 |
US2015357539(A1) |
申请公布日期 |
2015.12.10 |
申请号 |
US201514826283 |
申请日期 |
2015.08.14 |
申请人 |
NICHIA CORPORATION |
发明人 |
MATSUDA Yoshikazu;OKAMOTO Kazuto |
分类号 |
H01L33/64;H01L33/40;H01L33/60;H01L33/32 |
主分类号 |
H01L33/64 |
代理机构 |
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代理人 |
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主权项 |
1. A vertical nitride semiconductor device, comprising:
a conductive substrate having a first surface, a second surface opposite to the first surface and side surfaces; a semiconductor layer bonded to a side of the first surface of the conductive substrate via a second electrode and made of nitride; a metal layer formed on the second surface of the conductive substrate; a first electrode formed on a front surface facing a bonding front surface of the semiconductor layer; and a bonding layer formed between the conductive substrate and the second electrode and made of an electrode material or a conductive material, wherein the conductive substrate has a flange part, which extends from the side surfaces of the conductive substrate, on a side of the second surface thereof, wherein each of at least two of the side surfaces of the conductive substrate on the side of the first surface is flush with a corresponding side surface of the semiconductor layer and a corresponding side surface of the bonding layer and each of at least two side surfaces of the flange part is flush with a corresponding side surface of the metal layer. |
地址 |
Anan-shi JP |