APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

摘要

The present invention relates to a substrate processing apparatus which processes a substrate. The substrate processing apparatus includes: a chamber forming a space inside; a substrate support installed in the chamber and supporting the substrate inside the chamber; a process gas spraying unit disposed to face the substrate support on an upper side of the chamber and spraying process gas to the substrate; and a cleaning gas spraying unit connected to a side of the chamber and spraying cleaning gas into the chamber. The substrate processing apparatus and a cleaning method thereof can effectively remove a deposit by spraying the cleaning gas toward a region of which a deposit concentration level is high.