摘要 |
The present invention provides an imprint apparatus which forms an imprint material provided on a shot region of a substrate by using a mold. The imprint apparatus of the present invention comprises: a detection unit configured to detect each one of the marks provided on the mold and each one of the marks provided on the shot region respectively; and a control unit configured to carry out position alignment between the substrate and the mold based on the detection result by the detection unit. The control unit acquires predictive value for a position of the mark provided on the shot region by using information on distortion of the shot region, determines the marks, which shows discrepancy between the detection result and the predictive value beyond an acceptable range, as an abnormal mark, and carries out the position alignment without using a detection result on the abnormal marks. |