| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate support device capable of horizontally supporting a substrate, such as a wafer.SOLUTION: A substrate support device comprises: a plurality of rotation posts 2 arranged along a peripheral edge part of a substrate W, and in each of which a conical guide surface 12 is formed at a top part; at least one pedestal 15 that has a substrate support surface 15 arranged below the guide surface 12; a motor 9 for rotating the plurality of rotation posts 2 around their shaft center; and a plurality of liquid passages 20 that extend in the plurality of rotation posts 2, respectively. The plurality of liquid passages 20 have a plurality of liquid outlets 20b formed at upper ends of the plurality of rotation posts 2. |
