| 摘要 |
The purpose of the present invention is to provide a gas barrier film that exhibits exceptional adhesion between a clear hard coat layer and a gas barrier layer while maintaining gas barrier performance. This gas barrier film (F) is characterized in that, of the distribution curves of the constituent elements of a clear hard coat layer (4) and a gas barrier layer (6), the distribution curves being based on elemental distribution measurements taken in the depth direction by X-ray photoelectric spectroscopy, the width of a composition gradient region of a carbon distribution curve that indicates the relationship between distance from the surface of the gas barrier layer (6) in the thickness direction of the gas barrier layer (6) at the side thereof that faces the clear hard coat layer (4), and the ratio of the number of carbon atoms to the total number of carbon atoms, silicon atoms, and oxygen atoms (100 at%) (carbon atom ratio), or of an oxygen distribution curve that indicates the relationship between this distance and the ratio of the number of oxygen atoms to the total number of carbon atoms, silicon atoms, and oxygen atoms (100 at%) (oxygen atom ratio), is within a range of 7-20 nm. |
