发明名称 POLISHING PAD AND METHOD FOR MANUFACTURING POLISHING PAD
摘要 PROBLEM TO BE SOLVED: To provide a polishing pad that provides high-polishing efficiency.SOLUTION: A polishing pad 1 for polishing a surface to be polished of a workpiece is formed in a plate shape having a polishing surface A for polishing the workpiece and a reverse surface B that is a surface on an opposite side of the polishing surface and includes multiple fiber members 3, at least one end of which being exposed at the polishing surface, which are fixed by a resin 5 and extended between the reverse surface and the polishing surface.
申请公布号 JP2015221462(A) 申请公布日期 2015.12.10
申请号 JP20140105835 申请日期 2014.05.22
申请人 DISCO ABRASIVE SYST LTD 发明人 ISOBE AKIRA
分类号 B24B37/24;H01L21/304 主分类号 B24B37/24
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