| 主权项 |
1. A method for manufacturing a volumetric object by lithography, including:
a) supplying in a working volume a layer of photosensitive material arranged to harden under the influence of a radiation, b) creating, through a mask and a radiation source, a projection image leaving the mask, c) projecting the projection image onto a plane to be illuminated of the material layer, d) displacing the projection image in the plane to be illuminated along a first displacement direction and displacing the projection image in the plane to be illuminated along a second displacement direction different from the first direction and not superimposed on the first direction, these two displacement directions being contained within the plane to be illuminated, wherein to displace the projection image along the first displacement direction:
the mask is displaced in a movement having a component along an oblique axis forming an angle with the plane to be illuminated, andthis movement of the mask having the component along the oblique axis forming the angle with the plane to be illuminated is transformed by displacing the projection image on the plane to be illuminated along the first displacement direction contained in the plane to be illuminated by means of a mirror which reflects toward the plane to be illuminated the projection image produced by the mask. |
