| 摘要 |
PROBLEM TO BE SOLVED: To provide exposure equipment capable of forming a desired device pattern onto a substrate by removing an unnecessary liquid when projecting and exposing a pattern onto the substrate via a projection optical system and a liquid.SOLUTION: The exposure equipment, to expose a substrate by projecting a pattern image onto the substrate via the projection optical system and the liquid, comprises a liquid removing mechanism to remove a residual liquid on a component disposed in the vicinity of an image plane of the projection optical system. |
