发明名称 |
QUANTUM WELL FIN-LIKE FIELD EFFECT TRANSISTOR (QWFINFET) HAVING A TWO-SECTION COMBO QW STRUCTURE |
摘要 |
The present disclosure provides a quantum well fin field effect transistor (QWFinFET). The QWFinFET includes a semiconductor fin over a substrate and a combo quantum well (QW) structure over the semiconductor fin. The combo QW structure includes a QW structure over a top portion of the semiconductor fin and a middle portion of the semiconductor fin. The semiconductor fin and the QW comprise different semiconductor materials. The QWFinFET also includes a gate stack over the combo QW structure. |
申请公布号 |
US2015357472(A1) |
申请公布日期 |
2015.12.10 |
申请号 |
US201414298494 |
申请日期 |
2014.06.06 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Huang Yu-Lien;Fan Chun-Hsiang;Li Yung-Ta |
分类号 |
H01L29/78;H01L29/66;H01L29/775 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
1. A quantum well fin field effect transistor (QWFinFET) comprising:
a semiconductor fin over a substrate; a combo quantum well (QW) structure over the substrate, the combo QW structure including:
a QW structure wrapping over a top portion of the semiconductor fin; anda middle portion of the semiconductor fin that is not covered by the QW structure, wherein the semiconductor fin and the QW structure comprise different semiconductor materials; and a gate stack wrapping over the combo QW structure. |
地址 |
Hsin-Chu TW |