发明名称 WAFER LEVEL PACKAGE AND A FABRICATING METHOD THEREOF
摘要 A wafer level package and its manufacturing method are provided to increase wall illumination and to have a vertical shape of a hole by manufacturing a through-hole using photoresist. A pillar is formed on an upper substrate(300). A seed layer is deposited on a lower substrate(310). A photoresist(320) is applied to the seed layer. An MEMS(Micro Electrical Mechanical System) structure(350) is mounted on the photoresist. A junction unit(340) couples the upper substrate to the lower substrate. The upper substrate and the lower substrate is one of glass, ceramic, and silicon. The photoresist includes a pillar(330) on an upper portion thereof. Plural through holes are formed on the photoresist. A metal line is formed in a through-hole(360).
申请公布号 KR20070028198(A) 申请公布日期 2007.03.12
申请号 KR20050083448 申请日期 2005.09.07
申请人 KYONGGI PROVINCIAL GOVERNOR;KOREA ELECTRONICS TECHNOLOGY INSTITUTE 发明人 CHUNG, SEOK WON;LEE, DAE SUNG;SUNG, WOO KYUNG;CHO, NAM KYU;KIM, WON HYO;HWANG, HAK IN
分类号 H01L23/48 主分类号 H01L23/48
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