| 摘要 |
PROBLEM TO BE SOLVED: To suppress leakage of a liquid.SOLUTION: An exposure apparatus exposes a substrate to exposure light through a projection optical system and a liquid. The exposure apparatus includes a first stage which is mounted with a substrate and is movable within a specified region including a first region to be arranged with the projection optical system and a second region different from the first region, a second stage which is movable in a specified region, a linear motor system which moves from one of the first and second regions to the other individually in the first and second stages and moves independently within a specified region in the first and second stages, a liquid immersion system which supplies a liquid immediately under the projection optical system to form a liquid immersion region, and a control system which is moved by the linear motor system under the projection optical system in the first and second stages while keeping the liquid immersion region immediately under the projection optical system so that one of a first state where the liquid immersion region is kept between the projection optical system and the first stage and a second state where the liquid immersion region is kept between the projection optical system and the second stage transitions to the other of the first and second states. |
