发明名称 APPARATUS FOR TREATING SUBSTRATE
摘要 The present invention relates to an apparatus for processing a substrate. According to one embodiment of the present invention, the apparatus for processing a substrate includes: a container having a processing space inside; a substrate support unit located inside the container and supporting a substrate; and a spraying member spraying a processing solution onto the substrate placed on the substrate support unit. Veining is formed on an inner side of the container.
申请公布号 KR20150138544(A) 申请公布日期 2015.12.10
申请号 KR20140065389 申请日期 2014.05.29
申请人 SEMES CO., LTD.;SAMSUNG ELECTRONICS CO., LTD. 发明人 SONG, GIL HUN;CHOI, KI RYONG;CHOI, YOUNG CHOL;PARK, GUI SU;PARK, SUN YONG
分类号 H01L21/302;H01L21/02;H01L21/683 主分类号 H01L21/302
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