| 摘要 |
PROBLEM TO BE SOLVED: To provide a mask blank which enables formation of alignment marks between a laminate structure of a light translucent film, an etching stopper film and a light shielding film and a light transmissive substrate.SOLUTION: A mask blank 100 has a structure in which a light translucent film 2, an etching stopper film 3, a light shielding film 4 and an etching mask film 5 are laminated, in this order, on a light transmissive substrate 1. The light translucent film 2 and the light shielding film 3 are composed of a material allowing dry etching with a fluorine-based gas, and the etching stopper film and the etching mask film are composed of a material containing chromium. With the thickness of the etching stopper film expressed as Ds, the etching grade of the etching stopper film to an oxygen-containing chlorine-based gas as Vs, the thickness of the etching mask film as Dm and the etching grade of the etching mask film to the oxygen-containing chlorine-based gas as V, the relation (Dm/Vm)>(Ds/Vs) is satisfied. |
