| 摘要 |
PROBLEM TO BE SOLVED: To provide a copolymer composition capable of forming a cured coating film having good sensitivity and developability and excellent thermal decomposition resistance, thermal yellowing resistance, and solvent resistance.SOLUTION: The present invention provides: an alkali-developable resin composition which contains a copolymer (A) synthesized using glycidyl (meth)acrylate, having no acid group, and having a weight-average molecular weight of 1,000-50,000 in terms of polystyrene, and a copolymer (B) having an acid group and having a weight-average molecular weight of 1,000-50,000 in terms of polystyrene; and a resin composition, a photosensitive resin composition, and the like containing the copolymer composition. |
