SUBSTRATE CLEANING APPARATUS

摘要

A substrate cleaning apparatus includes outer circumference supporting members 32 that support the outer circumference of a rotating substrate W, a swing cleaning member 34 that swings between a first peripheral position B and a second peripheral position B′ of the substrate W while passing a center portion A of the substrate W to clean a front surface of the rotating substrate W, and an elongated supporting member 36 that extends long from a third peripheral position C to a fourth peripheral position C′ of the substrate W so as to pass the center portion A and supports the rear surface of the rotating substrate W. The first peripheral position B is disposed between a position D of the outer circumference supporting member 32 of the plurality of outer circumference supporting members 32 and closest to the third peripheral position C and the third peripheral position C.

主权项

1. A substrate cleaning apparatus, comprising:
a plurality of outer circumference supporting members that support outer circumference of a substrate; a swing cleaning member that swings between a first peripheral position and a second peripheral position of the substrate while passing a center portion of the substrate to clean a front surface of the substrate; and an elongated supporting member that extends long from a third peripheral position and a fourth peripheral position of the substrate so as to pass the center portion of the substrate and supports the rear surface of the rotating substrate, wherein one of the first peripheral position and the second peripheral position is disposed between a position of an outer circumference supporting member closest to the third peripheral position and the third peripheral position, or between a position of an outer circumference supporting member closest to the fourth peripheral position and the fourth peripheral position.