发明名称 インプリント方法
摘要 <p>Provided is an imprinting method for transferring a pattern formed on a mold to a substrate, the imprinting method including applying a resin to a predetermined shot area on the substrate; moving the shot area from an application position to an imprinting position; supplying gas to the shot area; and imprinting the mold into the shot area, wherein, in the gas supply step, gas is supplied only from a gas supplying unit located above a moving path extending from the application position to the imprinting position, and the supply of the gas is started before the shot area passes beneath the gas supplying unit to thereby supply the gas to the shot area while moving it.</p>
申请公布号 JP5828626(B2) 申请公布日期 2015.12.09
申请号 JP20100224819 申请日期 2010.10.04
申请人 キヤノン株式会社 发明人 成岡 晋太郎;江本 圭司;新井 剛
分类号 H01L21/027;B29C59/02;G11B5/84;G11B5/855 主分类号 H01L21/027
代理机构 代理人
主权项
地址