| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion exposure method capable of evading the deterioration of image forming performance in immersing and exposing. <P>SOLUTION: The immersion exposure method can perform the exposure of an irradiation area covered with the immersion area 15 of an unexposed substrate while relatively moving with respect to the unexposed substrate, the immersion area 15 which is formed to be interposed between the substrate to be exposed and placed on an exposure stage, and a projection lens. In this case, the method includes: a first exposure movement process for exposing the first exposure area 61 of the substrate to be exposed by moving the exposure stage in a first direction; a second exposure movement process for exposing the second exposure area 62 adjacent to the first exposure area 61 by moving the exposure stage in a second direction opposite to the first direction; and an unexposure movement process for moving the exposure stage from the movement end position of the exposure stage in the first exposure movement process to the movement start position of the exposure stage in the second exposure movement process in a state that the second exposure area 62 is held in the immersion boundary 151 of the immersion area 15. <P>COPYRIGHT: (C)2008,JPO&INPIT |
