| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a division sequential proximity exposure method and a division sequential proximity exposure device with which arbitrary patterns with different size can be transferred and exposed to an arbitrary position on a substrate by one exposure device to improve production efficiency and effectively use substrates without waste. <P>SOLUTION: The division sequential proximity exposure device PE includes a substrate holder 21 which holds a substrate W, a mask holder 12 which holds a mask M having a plurality of exposure patterns P of different sizes, an irradiation means 40 for irradiating the substrate W with light for pattern exposure through the mask M, and a mask aperture mechanism 19 having lower and upper apertures 91, 92, 93, and 94 moving beyond the intermediate position of the mask M to partially cut off the light for pattern exposure. <P>COPYRIGHT: (C)2008,JPO&INPIT |
