发明名称 半導体装置の作製方法
摘要 An object is to provide a thin film transistor using an oxide semiconductor layer, in which contact resistance between the oxide semiconductor layer and source and drain electrode layers is reduced and electric characteristics are stabilized. The thin film transistor is formed in such a manner that a buffer layer including a high-resistance region and low-resistance regions is formed over an oxide semiconductor layer, and the oxide semiconductor layer and source and drain electrode layers are in contact with each other with the low-resistance region of the buffer layer interposed therebetween.
申请公布号 JP5830588(B2) 申请公布日期 2015.12.09
申请号 JP20140160917 申请日期 2014.08.07
申请人 株式会社半導体エネルギー研究所 发明人 淺野 裕治;肥塚 純一
分类号 H01L21/336;G09F9/30;H01L27/32;H01L29/786 主分类号 H01L21/336
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