| 摘要 |
PROBLEM TO BE SOLVED: To increase a ratio of a polishing rate for an interconnecting surface of a nonmagnetic substrate to a polishing rate for a sidewall surface in an end face polishing process for nonmagnetic substrates, such as glass substrates, for magnetic disks.SOLUTION: An end face polishing process for a nonmagnetic substrate involves polishing an end face of a nonmagnetic substrate by; placing a magnetic functional fluid containing polishing abrasive particles in a groove of a groove-bearing member, generating a magnetic field using magnetic field generation means such that magnetic field lines point in a width direction of the groove, and having an end face of a glass substrate brought into contact with and moved relative to the magnetic functional fluid placed in the groove. The groove has a bottom-side section where the width thereof decreases with increasing depth in a cross-section of the groove.SELECTED DRAWING: Figure 2 |
